Stability of Ta-encapsulating Si clusters on Si(111)-(7x7) surfaces

被引：19

作者：

Uchida, N ^{[1
]}

Bolotov, L ^{[1
]}

Miyazaki, T ^{[1
]}

Kanayama, T ^{[1
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, MIRAI Project, Area Semicond Res Ctr, Tsukuba, Ibaraki 3058562, Japan

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2003年 / 36卷 / 09期

关键词：

D O I：

10.1088/0022-3727/36/9/101

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Tantalum containing, Si cluster ions TaSi10-13Hx+ were synthesized in an ion trap and deposited onto Si(111)-(7 x 7) surfaces with a kinetic energy of 18 eV. Scanning tunnelling microscope observations revealed that the clusters adsorbed on the surface without decomposition, consistent with ab initio calculation results, that predicted the clusters would have stable Si-cage structures with a Ta atom at the centre.

引用

页码：L43 / L46

页数：4

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