Scanning tunneling microscope study of striated carbon ridges in few-layer epitaxial graphene formed on 4H-silicon carbide (0001)

被引:13
|
作者
Harrison, S. E. [1 ]
Capano, M. A. [1 ]
Reifenberger, R. [2 ]
机构
[1] Purdue Univ, Sch Elect & Comp Engn, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
[2] Purdue Univ, Dept Phys, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA
关键词
elemental semiconductors; graphene; scanning tunnelling microscopy; semiconductor epitaxial layers; ELASTIC SHEET; GRAPHITE; MEMBRANES; STRESS; SUPERLATTICES; MOBILITY; FILMS;
D O I
10.1063/1.3323092
中图分类号
O59 [应用物理学];
学科分类号
摘要
Atomically resolved scanning tunneling microscope images of carbon ridge defects found in few-layer graphene formed on the C-face (0001) of 4H-silicon carbide reveal a striated exterior surface formed from out-of-plane distortions of the hexagonal graphene lattice. While ridge formation is likely explained by compressive in-plane stresses coupled with the small values of the bending modulus for few-layer graphene, the striated structure along the ridges argues for a localized unidirectional stress in the material directed along the ridge length.
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页数:3
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