Preparation and physical properties of MoO3 thin films

被引:1
|
作者
Yahaya, M [1 ]
Salleh, MM [1 ]
Talib, IA [1 ]
Nor, NM [1 ]
机构
[1] Univ Kebangsaan Malaysia, Dept Phys, Bangi 43600, Malaysia
关键词
molybdenum oxide; thin film; electron beam evaporation;
D O I
10.1117/12.300703
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thin films of MoO3 were prepared by electron beam evaporation technique. The films were deposited onto glass substrates maintained at temperatures in the range 100-250 degrees C. The films were characterized by studying their structure, electrical and optical properties. The films formed at 100 degrees C are amorphous with conductivity of about 2.5 x 10(-5) Ohm(-1) cm(-1). The effect of deposition temperature on the properties of the films were studied and discussed.
引用
收藏
页码:42 / 46
页数:5
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