Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor

被引：1

作者：

Maas, Diederik ^{[1
]}

Muilwijk, Pim ^{[1
]}

van Putten, Michel ^{[1
]}

de Graaf, Frank ^{[1
]}

Kievit, Olaf ^{[1
]}

Boerboom, Patrique ^{[1
]}

Koster, Norbert ^{[1
]}

机构：

[1] TNO, Stieltjesweg 1, NL-2628 CK Delft, Netherlands

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI | 2017年 / 10145卷

关键词：

Molecular contamination; Vacuum; Sensor; Detection; Monitoring; Carbon contamination; Semiconductor manufacturing; Yield enhancement; DESORPTION; SURFACES; GRAPHITE; OPTICS;

D O I：

10.1117/12.2258230

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

To produce high-end semiconductor products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. This is where MFIG can help. The mass-filtered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass contaminant molecules with a sensitivity down to 1E-13 mbar at total pressures up to 1E-5 mbar. This contribution presents laboratory and field-test data to demonstrate the capabilities of the latest version of the MFIG sensor in continuously and selectively detecting high-mass contaminant molecules in (U) HV vacuum.

引用

页数：7

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