Predicting pharmaceutical degradation by UV (MP)/H2O2 processes: A kinetic model

被引:30
|
作者
Wols, B. A. [1 ,2 ,3 ]
Harmsen, D. J. H. [1 ]
Beerendonk, E. F. [1 ]
Hofman-Caris, C. H. M. [1 ]
机构
[1] KWR Watercycle Res Inst, NL-3430 BB Nieuwegein, Netherlands
[2] Delft Univ Technol, NL-2600 AA Delft, Netherlands
[3] Wetsus, Ctr Sustainable Water Technol, NL-8900 CC Leeuwarden, Netherlands
关键词
UV; Advanced oxidation process; Hydrogen peroxide; Pharmaceuticals; Water treatment; Modelling; ADVANCED OXIDATION PROCESSES; HYDROGEN-PEROXIDE; RATE CONSTANTS; AQUEOUS-SOLUTIONS; ORGANIC MICROPOLLUTANTS; HYDROXYL RADICALS; NITRITE FORMATION; BISPHENOL-A; NITRATE; PHOTODEGRADATION;
D O I
10.1016/j.cej.2014.10.101
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
A kinetic model for the degradation of organic micropollutants (OMPs) by MP UV lamps has been developed. The model includes (photo)chemical reactions of hydrogen peroxide and nitrate; reactions with the most important water matrix components; changes in pH; and transient radical concentrations. Three pathways of organic micropollutant degradation are involved: direct photolysis, hydroxyl radical reactions and carbonate radical reactions. The model was validated using collimated beam experiments for a group of 35 pharmaceuticals in synthetic and natural water matrices. For MP UV with 10 mg/L H2O2, good agreement between the modelled and measured degradation rates was found. For MP UV without H2O2, most of the pharmaceuticals were well predicted, except for the sulphonamides. A sensitivity analysis on different water matrix constituents was performed for MP UV with H2O2, NO and both H2O2 and NO3-. Also, the most important chemical reactions for the degradation of OMPs are identified for different water matrices. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:336 / 345
页数:10
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