Tagged-electron and Fick's diffusion coefficients from hot-electron velocity fluctuations in doped GaAs at 80K

被引:0
|
作者
Katilius, R [1 ]
Matulionis, A [1 ]
Raguotis, R [1 ]
Nougier, JP [1 ]
Vaissiere, JC [1 ]
Varani, L [1 ]
机构
[1] Lithuania Acad Sci, Inst Semicond Phys, LT-2600 Vilnius, Lithuania
关键词
D O I
暂无
中图分类号
O42 [声学];
学科分类号
070206 ; 082403 ;
摘要
The observed weak field dependence of electron mobility at moderate fields in Si-doped n-type GaAs at 80 K makes it possible to determine the electric field dependent Fick's diffusion coefficient of electrons from microwave noise temperature and mobility measurements even when the interelectron collisions cannot be neglected. It follows from Monte Carlo simulation that, contrary to mobility, microwave noise is quite sensitive to the intensity of interelectron collisions. The "tagged" electron diffusion coefficient given by the spectral density of one-electron velocity autocorrelation differs from Pick's diffusion coefficient because the history of the single electron cannot predict the characteristics of smoothing of gradients in the system of intercolliding electrons.
引用
收藏
页码:63 / 66
页数:4
相关论文
共 4 条
  • [1] Interparticle collisions and hot-electron velocity fluctuations in GaAs at 80 K
    Matulionis, A
    Raguotis, R
    Katilius, R
    PHYSICAL REVIEW B, 1997, 56 (04): : 2052 - 2057
  • [2] Hot-electron diffusion and velocity fluctuations in quantum well structures
    Aninkevicius, V
    Bareikis, V
    Katilius, R
    Koenraad, PM
    Kopev, PS
    Liberis, J
    Matulioniene, I
    Matulionis, A
    Ustinov, VM
    vanderVleuten, WC
    Wolter, JH
    HOT CARRIERS IN SEMICONDUCTORS, 1996, : 397 - 400
  • [3] VELOCITY AUTO-CORRELATION AND HOT-ELECTRON DIFFUSION CONSTANT IN GAAS AND INP
    ROY, MD
    NAG, BR
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 28 (03): : 195 - 204
  • [4] ENHANCED HOT-ELECTRON PHOTOLUMINESCENCE FROM HEAVILY CARBON-DOPED GAAS
    AITCHISON, BJ
    HAEGEL, NM
    ABERNATHY, CR
    PEARTON, SJ
    APPLIED PHYSICS LETTERS, 1990, 56 (12) : 1154 - 1156