Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy

被引:59
|
作者
Bogachev, S. A. [1 ]
Chkhalo, N. I. [2 ]
Kuzin, S. V. [1 ]
Pariev, D. E. [2 ]
Polkovnikov, V. N. [2 ,3 ]
Salashchenko, N. N. [2 ]
Shestov, S. V. [1 ]
Zuev, S. Y. [2 ]
机构
[1] Russian Acad Sci, PN Lebedev Phys Inst, Leninskiy Prospekt 53, Moscow, Russia
[2] Russian Acad Sci, Inst Phys Microstruct, GSP-105, Nizhnii Novgorod, Russia
[3] Nizhny Novgorod NI Lobachevskii State Univ, Ave Gagarina 23, Nizhnii Novgorod 603950, Russia
基金
俄罗斯基础研究基金会;
关键词
SOFT-X-RAY; HIGH REFLECTIVITY; MO-SI; STRESS; FILMS; STABILITY; OPTICS; EUV; REFLECTANCE; PERFORMANCE;
D O I
10.1364/AO.55.002126
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: lambda = 12.9-13.3 nm, lambda = 17-21 nm, lambda = 28-33 nm, and lambda = 58.4 nm. We found new material pairs, which will make new spaceborne experiments possible due to the high reflection efficiencies, spectral resolution, and long-term stabilities of the proposed multilayer coatings. In the spectral range lambda = 13 nm, Mo/Be multilayer mirrors were shown to demonstrate a better ratio of reflection efficiency and spectral resolution compared with the commonly used Mo/Si. In the spectral range lambda = 17-21 nm, a new multilayer structure Al/Si was proposed, which had higher spectral resolution along with comparable reflection efficiency compared with the commonly used Al/Zr multilayer structures. In the spectral range lambda = 30 nm, the Si/B4C/Mg/Cr multilayer structure turned out to best obey reflection efficiency and long-term stability. The B4C and Cr layers prevented mutual diffusion of the Si and Mg layers. For the spectral range lambda = 58 nm, a new multilayer Mo/Mg-based structure was developed; its reflection efficiency and long-term stability have been analyzed. We also investigated intrinsic stresses inherent for most of the multilayer structures and proposed possibilities for stress elimination. (C) 2016 Optical Society of America
引用
收藏
页码:2126 / 2135
页数:10
相关论文
共 50 条
  • [1] NORMAL INCIDENCE MULTILAYER MIRRORS FOR EXTREME ULTRAVIOLET ASTRONOMY
    STERN, RA
    HAISCH, BM
    JOKI, EG
    CATURA, RC
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 445 : 347 - 357
  • [2] Extreme ultraviolet multilayer mirrors for astronomical observation
    Wang, Zhanshan
    Zhu, Jingtao
    Chen, Rui
    Xu, Jing
    Wang, Fengli
    Zhang, Zhong
    Xu, Jing
    Wu, Wenjuan
    Liu, Liqin
    Zhang, Huijing
    Xu, Da
    Jiang, Hui
    Chen, Lingyan
    Zhou, Hongjun
    Huo, Tonglin
    Cui, Mingqi
    Zhao, Yidong
    THIN FILM PHYSICS AND APPLICATIONS, SIXTH INTERNATIONAL CONFERENCE, 2008, 6984
  • [3] Ion beam sputtered aluminum based multilayer mirrors for extreme ultraviolet solar imaging
    Ziani, A.
    Delmotte, F.
    Le Paven-Thivet, C.
    Meltchakov, E.
    Jerome, A.
    Roulliay, M.
    Bridou, F.
    Gasc, K.
    THIN SOLID FILMS, 2014, 552 : 62 - 67
  • [4] MOLYBDENUM-SILICON MULTILAYER MIRRORS FOR THE EXTREME ULTRAVIOLET
    BARBEE, TW
    MROWKA, S
    HETTRICK, MC
    APPLIED OPTICS, 1985, 24 (06): : 883 - 886
  • [5] Attosecond dispersion control by extreme ultraviolet multilayer mirrors
    Hofstetter, Michael
    Schultze, Martin
    Fiess, Markus
    Dennhardt, Benjamin
    Guggenmos, Alexander
    Gagnon, Justin
    Yakovlev, Vladislav S.
    Goulielmakis, Eleftherios
    Kienberger, Reinhard
    Gullikson, Eric M.
    Krausz, Ferenc
    Kleineberg, Ulf
    OPTICS EXPRESS, 2011, 19 (03): : 1767 - 1776
  • [6] POLARIMETRY OF EXTREME ULTRAVIOLET LINES IN SOLAR ASTRONOMY
    FINESCHI, S
    HOOVER, RB
    FONTENLA, JM
    WALKER, ABC
    OPTICAL ENGINEERING, 1991, 30 (08) : 1161 - 1168
  • [7] IMAGING POLARIMETERS FOR SOLAR EXTREME ULTRAVIOLET ASTRONOMY
    HOOVER, RB
    FINESCHI, S
    FONTENLA, JM
    WALKER, ABC
    OPTICAL ENGINEERING, 1991, 30 (08) : 1169 - 1176
  • [8] Aperiodic multilayer mirrors for efficient broadband reflection in the extreme ultraviolet
    Menesguen, Y.
    de Rossi, S.
    Meltchakov, E.
    Delmotte, F.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2010, 98 (02): : 305 - 309
  • [9] Damage threshold of extreme-ultraviolet multilayer mirrors measured
    Serna, R
    MRS BULLETIN, 2004, 29 (04) : 225 - 225
  • [10] Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet
    Skulina, K.M.
    Alford, C.S.
    Bionta, R.M.
    Makowiecki, D.M.
    Gullikson, E.M.
    Soufli, R.
    Kortright, J.B.
    Underwood, J.H.
    Applied Optics, 1995, 34 (19):