Tensoresistive Properties of Mo-, Ni- and Fe-Based Film Materials

被引：0
|
作者：
Buryk, I. P. [1 ]
Grychanovs'ka, T. M. [1 ]
Odnod-Vorets, L. V. [1 ]
机构：
[1] Sumy State Univ, UA-40007 Sumy, Ukraine
来源：
METALLOFIZIKA I NOVEISHIE TEKHNOLOGII | 2010年 / 32卷 / 03期
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SYSTEMS;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Tensoresistive properties of two-layer Mo/Ni and Mo/Fe films are investigated. The numerical calculations of electron-transport parameters, deformation coefficients and contributions of bulk, surface, grain-boundary and interface scatterings of electrons to the tensosensitivity factor are carried out. The approbation of the theoretical model of tensosensitivity with regard for deformation effects is performed.
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页码：345 / 355
页数：11
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