Effect of Deposition Conditions On Microstructure of LiPON Films Obtained by RF Magnetron Sputtering

被引：0
|
作者：
Kovalenko, L. [1 ]
V'yunov, O. [1 ]
Belous, A. [1 ]
Goutenoire, F. [2 ]
Gunes, V. [2 ]
Bohnke, O. [2 ]
机构：
[1] Vernadskii Inst Gen & Inorgan Chem NASU, Dept Solid State Chem, 32-34 Palladina Ave, UA-03680 Kiev, Ukraine
[2] Inst Molcules & Matriaux Mans, CNRS, UMR 6283, F-72085 Le Mans, France
来源：
2014 IEEE 34TH INTERNATIONAL CONFERENCE ON ELECTRONICS AND NANOTECHNOLOGY (ELNANO) | 2014年
关键词：
LiPON films; RF magnetron sputtering; SEM; impedance spectroscopy; PLASMA-ASSISTED DEPOSITION; IONIC-CONDUCTIVITY; LITHIUM; POWER;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Thin conductive amorphous lithium phosphorous oxynitride (LiPON) films were prepared by rf magnetron sputtering in various experimental conditions. rf power, temperature of substrate, pressure of working gas and deposition time were varied. The microstructure of the films has been investigated by scanning electron microscopy and phosphorous mappings. The optimal conditions of reactive sputtering have been determined, which allows the formation of dense, homogeneous, free of cracks, amorphous thin LiPON films, and stable under ambient atmosphere. An ionic conductivity of 3.2.10(-6) S.cm(-1) at room temperature has been determined by impedance spectroscopy.
引用
收藏
页码：126 / 130
页数：5
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