Influence of Nitrogen Incorporation Sites on Structural and Optical Properties of Sputtered TiO2-N Thin Films with Improved Visible Light Activity

The influence of deposition and annealing parameters on optical, structural and photocatalytic properties of N-doped titanium-dioxide (TiO2) thin films have been studied. Anatase and anatase-rutile crystalline phase mixture TiO2 thin films were obtained depending on the reactive direct current (DC) sputtering and annealing conditions. Deposition in the nitrogen atmosphere produced N-doped TiO2 thin films with energy gap values shifted towards visible region in comparison with thin TiO2 films deposited without nitrogen in the atmosphere. The role of substitutional and interstitial nitrogen atoms incorporated in obtained crystalline structures during the deposition was shown important and was reflected in the efficiency of photocatalysis. It was found that thin TiO2 films with more substitutional incorporated nitrogen exhibits better photocatalytic properties. These results could be of importance towards achieving controlled synthesis of N-doped TiO2 thin films with desired structural and optical properties, especially with improved photo-activity in the visible part of the solar spectrum.