Characterization and electron field emission from diamond coatings deposited by multiple laser process

A new diamond deposition process utilizing a plasma and a variety of interactions from a multiple laser system]las been demonstrated, with WC:Co substrates. The process is conducted in open air and dots not involve hydrogen. Structural characterization of the diamond coatings. which have exceptional adhesion to cutting tool inserts. indicates a cubic diamond structure. Tungsten and cobalt atoms are incorporated into the film and a layer depleted in cobalt exists al the diamond-WC/Co interface. Electron field emission current densities. useful for flat panel displays of 6 mA/cm(2) at an applied voltage of 3000 V fora film-anode distance of 20 mu m has been measured. (C) 1998 Elsevier Science S.A.