Coating of Ti-6Al-4V alloy substrates with TiN/Ti multi-layered films by magnetron sputtering

被引:0
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作者
Sonoda, T.
Kotake, S.
Katou, K.
Asahinal, T.
机构
[1] Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan
[2] Mie Univ, Dept Mech Engn, Tsu, Mie 5148507, Japan
来源
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D O I
10.1051/epjap:2007050
中图分类号
O59 [应用物理学];
学科分类号
摘要
Coating of Ti-6Al-4V alloy substrates with TiN/Ti multi-layered films by magnetron sputtering in Ar gas atmosphere was examined, aiming at the application of the alloy to artificial heart valves, in order to improve not only the adhesion between the deposited film and the alloy but also the surface smoothness of titanium nitride coatings and thereby to improve the blood compatibility as well as the biocompatibility of the alloy coated with the titanium nitride film. The effects of the thickness of the TiN (titanium nitride) layer on the surface morphology of the film were investigated, in order to develop TiN coatings with higher blood compatibility. The multi-layered films were deposited by sputtering in sequence pure titanium and titanium nitride targets. The thickness of titanium nitride layer was varied from 300 nm to 800 nm, while that of pure titanium was constantly 200 nm. Under visual observation, the obtained multi-layered films looked yellow gold and appeared to be uniform and adhesive, while TiN monolithic films deposited directly onto the alloy substrate under the same sputtering conditions peeled off partly. Therefore it was found that the multi-layered thin films were more adhesive to the alloy than the monolithic films. According to AFM (Atomic Force Microscope) images for both of the films, the surface morphology of each TiN layer observed under the scope of nanometer-scaled area was rough with pits and bumps, while that under the scope of micrometer-scaled area was smooth without such pits and bumps. Furthermore based on the AFM, the surface roughness sigma(RMS) measured under the area of nanometer scale was found to increase with the increase of the thickness of the TiN layer in the multi-layered film, although that measured under the area of micrometer scale was assumed to be independent of the thickness of the TiN layer.
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页码:69 / 72
页数:4
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