Simultaneous UV direct writing of channel waveguides and Bragg gratings in germanium-doped planar silica

被引：7

作者：

Marques, PVS ^{[1
]}

Bonar, JR

Leite, AMP

Aitchison, JS

机构：

[1] INESC PORTO, Optoelect & Elect Syst Unit, P-4169007 Oporto, Portugal

[2] Univ Porto, Dept Fis, Fac Ciencias, P-1069007 Oporto, Portugal

[3] Alcatel Optron UK Ltd, Livingston EH54 8SF, Scotland

[4] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada

来源：

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS | 2002年 / 8卷 / 06期

关键词：

Bragg gratings; direct writing; flame hydrolysis; integrated optics; optical devices; photosensitivity;

D O I：

10.1109/JSTQE.2002.806730

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Channel waveguides incorporating photo-imprinted Bragg gratings were produced in germano-borosilicate glass layers fabricated by flame hydrolysis deposition, through single-and double-step exposure direct writing processes with UV laser irradiation. To our knowledge, this is the first time that UV exposure has been used to simultaneously realize both waveguiding and spectral selectivity functions.

引用

页码：1316 / 1322

页数：7

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