Effect of substrate bias voltage on corrosion of TiN/Ti multilayers deposited by magnetron sputtering

被引：47

作者：

Flores, M.

Huerta, L.

Escamilla, R.

Andrade, E.

Muhl, S.

机构：

[1] Univ Guadalajara, CUCEL, Dept Ingn Proyectos, Zapopan Jal 45101, Mexico

[2] Univ Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico

[3] Univ Nacl Autonoma Mexico, Inst Fis, Mexico City 01000, DF, Mexico

来源：

APPLIED SURFACE SCIENCE | 2007年 / 253卷 / 17期

关键词：

TiN/Ti; corrosion; bias; magnetron sputtering;

D O I：

10.1016/j.apsusc.2007.02.203

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Austenitic stainless steel can be attack by localized corrosion in saline environments, such as seawater. TiN/Ti multilayers can improve the corrosion resistance of the stainless steel better than TiN monolayers, because the titanium layers improve the impermeability of TiN/Ti multilayers. In this work, 1.75-4.55 mu m thick layers were deposited on to grounded or -100 V biased substrates of 304 stainless steel substrates by reactive magnetron sputtering. The corrosion resistance of the layers was studied by means of potentiodynamic polarization in 0.5 M NaCl solutions. It was found that the pitting corrosion resistance was dependent on the bias and period number of the multilayers. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：7192 / 7196

页数：5

共 50 条

[1] The effect of substrate bias voltage on PbTe films deposited by magnetron sputtering
Ren, Wei
Cao, Wentian
Wang, Shuyun
Sui, Mingxiao
Lu, Huifen
[J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2011, 509 (20) : 5947 - 5951
[2] Ion beam analysis of TiN/Ti multilayers deposited by magnetron sputtering
Andrade, E
Flores, M
Muhl, S
Barradas, NP
Murillo, G
Zavala, EP
Rocha, MF
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 219 : 763 - 767
[3] The relation between the plasma characteristic and the corrosion properties of TiN/Ti multilayers deposited by unbalanced magnetron sputtering
Flores, M
Muhl, S
Andrade, E
[J]. THIN SOLID FILMS, 2003, 433 (1-2) : 217 - 223
[4] Study of the deposition of Ti/TiN multilayers by magnetron sputtering
Saoula, N.
Djerourou, S.
Yahiaoui, K.
Henda, K.
Kesri, R.
Erasmus, R. M.
Comins, J. D.
[J]. SURFACE AND INTERFACE ANALYSIS, 2010, 42 (6-7) : 1176 - 1179
[5] Effect of substrate bias voltage and substrate on the structural properties of amorphous carbon films deposited by unbalanced magnetron sputtering
Ahmad, I
Roy, SS
Maguire, PD
Papakonstantinou, P
McLaughlin, JA
[J]. THIN SOLID FILMS, 2005, 482 (1-2) : 45 - 49
[6] Effect of Bias Voltage on Microstructure and Mechanical Properties of Nanocrystalline TiN Films Deposited by Reactive Magnetron Sputtering
Chun, Sung-Yong
[J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2011, 11 (02) : 1758 - 1761
[7] Bias Voltage Effect on the Properties of TiN Films by Reactive Magnetron Sputtering
Chun, Sung-Yong
[J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2010, 56 (04) : 1134 - 1139
[8] The Effect of Substrate Bias Voltage on the Electrochemical Corrosion Behaviors of thin Film Deposited on Stainless Steel by r. f Magnetron Sputtering
Madaoui, N.
Saoula, N.
Kheyar, K.
Nezar, S.
Tadjine, R.
Hammouche, A.
Belhousse, S.
[J]. PROTECTION OF METALS AND PHYSICAL CHEMISTRY OF SURFACES, 2017, 53 (03) : 527 - 533
[9] The effect of substrate bias voltage on the electrochemical corrosion behaviors of thin film deposited on stainless steel by r. f magnetron sputtering
N. Madaoui
N. Saoula
K. Kheyar
S. Nezar
R. Tadjine
A. Hammouche
S. Belhousse
[J]. Protection of Metals and Physical Chemistry of Surfaces, 2017, 53 : 527 - 533
[10] Effect of roughness of substrate and sputtering power on the properties of TiN coatings deposited by magnetron sputtering for ATF
Xiao, Weiwei
Deng, Hua
Zou, Shuliang
Ren, Yuhong
Tang, Dewen
Lei, Ming
Xiao, Changfei
Zhou, Xi
Chen, Yao
[J]. JOURNAL OF NUCLEAR MATERIALS, 2018, 509 : 542 - 549

← 1 2 3 4 5 →