Optical and Electrical Properties of Thin NiO Films Deposited by Reactive Magnetron Sputtering and Spray Pyrolysis

被引：7

作者：

Parkhomenko, H. P. ^{[1
]}

Solovan, M. N. ^{[1
]}

Mostovoi, A. I. ^{[1
]}

Orletskii, I. G. ^{[1
]}

Parfenyuk, O. A. ^{[1
]}

Maryanchuk, P. D. ^{[1
]}

机构：

[1] Fedkovich Chernivtsi Natl Univ, UA-58012 Chernovtsy, Ukraine

来源：

OPTICS AND SPECTROSCOPY | 2017年 / 122卷 / 06期

关键词：

D O I：

10.1134/S0030400X17060145

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Thin NiO films are deposited by reactive magnetron sputtering and spray pyrolysis. The main optical constants, i.e., refractive index n(lambda), absorption coefficient alpha(lambda), extinction coefficient k(lambda), and thickness d, are determined. The temperature dependence of the resistance of thin films is found, and the activation energy of films deposited by different methods is determined.

引用

页码：944 / 948

页数：5

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