Fabrication of nanoparticles of oxide materials by UV pulsed laser ablation in gas phase

被引：0

作者：

Suzuki, Rio ^{[1
]}

Koike, Reiji ^{[1
]}

Katayama, Keita ^{[1
]}

Higashihata, Mitsuhiro ^{[1
]}

Ikenoue, Hiroshi ^{[1
,2
]}

Nakamura, Daisuke ^{[1
]}

机构：

[1] Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Nishi Ku, 744 Motooka, Fukuoka 8190395, Japan

[2] Kyushu Univ, Dept Gigaphoton Next GLP, Nishi Ku, 744 Motooka, Fukuoka 8190395, Japan

来源：

LASER-BASED MICRO- AND NANOPROCESSING XV | 2021年 / 11674卷

关键词：

nanoparticles; laser ablation; nanoporous film; DIELECTRIC-CONSTANT MATERIALS; DEPOSITION; PRESSURE; FILMS;

D O I：

10.1117/12.2576843

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

SiO2 nanoporous films has been attracting attention as low-k dielectric constant insulating films. We have succeeded in SiO2 nanoparticles with a particle size of a few nm and depositing a nanoporous film by pulsed laser deposition with controlling the ambient gas pressure. However, the details of the formation process of SiO2 nanoparticles have not been clarified. In this study, we visualized the time-resolved nanoparticle distribution in the gas phase by laser imaging technique to clarify the nanoparticle formation process and to be helpful for optimizing the growth condition of the low-k nanoporous film.

引用

页数：7

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