Cross-sectional transmission electron microscopy observations on the Berkovich indentation-induced deformation microstructures in GaN thin films

被引:47
|
作者
Chien, Chi-Hui
Jian, Sheng-Rui [1 ]
Wang, Chung-Ting
Juang, Jenh-Yih
Huang, J. C.
Lai, Yi-Shao
机构
[1] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu 300, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Mech & Electromech Engn, Kaohsiung 804, Taiwan
[3] Natl Sun Yat Sen Univ, Ctr Nanosci & Nanotechnol, Kaohsiung 804, Taiwan
[4] Natl Taiwan Normal Univ, Dept Phys, Taipei 106, Taiwan
[5] Natl Sun Yat Sen Univ, Inst Mat Sci & Engn, Kaohsiung 804, Taiwan
[6] Adv Semicond Engn Inc, Cent Labs, Kaohsiung 811, Taiwan
关键词
D O I
10.1088/0022-3727/40/13/011
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nanoindentation-induced mechanical deformation in GaN thin films prepared by metal-organic chemical-vapour deposition was investigated using the Berkovich diamond tip in combination with the cross-sectional transmission electron microscopy (XTEM). By using focused ion beam milling to accurately position the cross-section of the indented region, the XTEM results demonstrate that the major plastic deformation was taking place through the propagation of dislocations. The present observations are in support of attributing the pop-ins that appeared in the load-displacement curves to the massive dislocation activities occurring underneath the indenter during the loading cycle. The absence of indentation-induced new phases might have been due to the stress relaxation via the substrate and is also consistent with the fact that no discontinuity was found upon unloading.
引用
收藏
页码:3985 / 3990
页数:6
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