Editorial - Trends in digital speckle pattern interferometry

被引：2
|
作者：
Murukeshan, VM [1 ]
机构：
[1] Nanyang Technol Univ, Sch Mech & Prod Engn, Singapore 639798, Singapore
来源：
OPTICS AND LASERS IN ENGINEERING | 2003年 / 39卷 / 04期
关键词：
D O I：
10.1016/S0143-8166(02)00033-7
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：409 / 410
页数：2
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