Analysis of excitation processes and electron temperature changes from spectral data in a dc micro plasma discharge

被引：10

作者：

Mariotti, D ^{[1
]}

Maguire, P ^{[1
]}

Mahony, CMO ^{[1
]}

McLaughlin, J ^{[1
]}

机构：

[1] Univ Ulster, NIBEC, Jordanstown BT37 0QB, Newtownabbey, North Ireland

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 2004年 / 13卷 / 04期

关键词：

D O I：

10.1088/0963-0252/13/4/004

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A micro scale dc plasma discharge was studied to determine the potentialities for lab-on-the-chip applications. Different working conditions for the micro plasma discharge were considered: the pressure was varied between 2.7 and 5.3 kPa and the applied dc voltage was between 400 and 540 V, generating a discharge current in the range of 0.02-0.09 mA. The electrode distance was maintained at 0.025 cm and argon was used as the gas for the formation of plasma discharges. The number densities of excited states were determined by spectral emission data (400-1000 nm) and then were calculated by introducing a few assumptions: comparison of experimental and calculated number densities allowed an analysis of a volume averaged electron energy distribution function. Also, it was possible to estimate an effective electron temperature for different conditions of pressure and applied voltage.

引用

页码：576 / 581

页数：6

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