plasmon;
hot-electron dynamics;
metal/semiconductor interfaces;
heterogeneous electron transfer;
recombination suppression;
D O I:
10.1021/acsanm.0c03358
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
The recent discovery that metal nanoparticles can generate hot carriers upon light excitation is seen as a breakthrough in the fields of plasmonics and photonics. However, the high expectations for a plasmonic revolution in applications have been dampened by the ultrafast energy dissipation of surface plasmon polariton modes. While research aimed at suppressing loss mechanisms is still pursued, another research direction has emerged where charges are harnessed before they relax. Despite the effort, efficiencies of devices based on hot carriers harnessed from plasmonics are typically very low (a few percent), which is somehow paradoxical since efficiencies for electron injection efficiency have been reported to be in the range from 25% to 40% and hole injection up to 85%. This indicates that the low device performance relates to the undesirable charge back-transfer process, which happens in the picosecond time scale. In this context, we performed a comparative ultrafast spectroscopy investigation with gold nanoparticles in direct contact with different metal oxides, namely, TiO2, ZnO, SnO2, and Al:ZnO. Electron dynamics revealed the decisive role of metal/semiconductor interfaces and semiconductor electronic structure in electron injection efficiency and recombination, with significant implications to the fields of photocatalysis and photovoltaics.
机构:Institut d'Electronique et de Microélectronique du Nord (IEMN), UMR 9929, C.N.R.S., Institut Supérieur d'Electronique du Nord (ISEN), 59046 LILLE Cedex
VUILLAUME, D
BRAVAIX, A
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机构:Institut d'Electronique et de Microélectronique du Nord (IEMN), UMR 9929, C.N.R.S., Institut Supérieur d'Electronique du Nord (ISEN), 59046 LILLE Cedex
机构:
Inst for Basic Sci Korea, Ctr Nanomat & Chem React, Taejon 305701, South Korea
Korea Adv Inst Sci & Technol, Grad Sch EEWS, Taejon 305701, South KoreaInst for Basic Sci Korea, Ctr Nanomat & Chem React, Taejon 305701, South Korea
Kim, Sun Mi
Lee, Hyosun
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机构:
Inst for Basic Sci Korea, Ctr Nanomat & Chem React, Taejon 305701, South Korea
Korea Adv Inst Sci & Technol, Grad Sch EEWS, Taejon 305701, South KoreaInst for Basic Sci Korea, Ctr Nanomat & Chem React, Taejon 305701, South Korea
Lee, Hyosun
Park, Jeong Young
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机构:
Inst for Basic Sci Korea, Ctr Nanomat & Chem React, Taejon 305701, South Korea
Korea Adv Inst Sci & Technol, Grad Sch EEWS, Taejon 305701, South KoreaInst for Basic Sci Korea, Ctr Nanomat & Chem React, Taejon 305701, South Korea