Tribological properties of a-C:H films coated by the PBII method

被引:7
|
作者
Watanabe, T
Ishihara, M
Yamamoto, K
Tsuda, O
Tanaka, A
Takai, O
Koga, Y
机构
[1] Japan Fine Ceram Ctr, Joint Res Consorium Frontier Carbon Technol, Res Ctr Adv Carbon Mat, Tsukuba, Ibaraki 3058565, Japan
[2] Nagoya Univ, Ctr Integrated Res Sci & Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[3] Res Ctr Adv Carbon Mat, Tsukuba, Ibaraki 3058565, Japan
关键词
plasma-based ion implantation; ECR plasma with a mirror field; carbon film; chemical bonding; tribological property;
D O I
10.1016/S0925-9635(03)00010-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Amorphous hydrogenated carbon (a-C:H) films were synthesized by the plasma-based ion implantation (PBII) technique using an electron cyclotron resonance plasma source with a mirror field with the simultaneous application of a DC and a pulse bias to the substrate. The influence of the duty ratio of the pulse biasing on the property and the uniformity of the a-C:H films for threedimensional surfaces were investigated. An a-C:H film with a low friction coefficient (0.02) and low wear rate (6 X 10(-8) mm(3)/Nm) under a high conducted load (20 N) could be formed by the simultaneous application of a pulse (-2 kV) of low duty ratio (1%) and a DC bias (-200 V). The thickness, structure, and friction coefficient of the a-C:H film for the three-dimensional surfaces were very uniform. Furthermore, the deposition of a-C:H films on a drilling tool of high-speed steel was carried out, and a uniform film was obtained, because a uniform plasma was formed around the drilling tool. Finally, the uniformity of the film thickness for three-dimensional surfaces was improved within +/- 10% in distribution by both the DC biasing and the pulse biasing with a short duration. 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:105 / 109
页数:5
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