Richardson's constant in inhomogeneous silicon carbide Schottky contacts

被引:214
|
作者
Roccaforte, F
La Via, F
Raineri, V
Pierobon, R
Zanoni, E
机构
[1] CNR, IMM, Sez Catania, I-95121 Catania, Italy
[2] Univ Padua, Dept Informat Engn, I-35131 Padua, Italy
关键词
D O I
10.1063/1.1573750
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electrical characterization of nickel silicide Schottky contacts on silicon carbide (4H-SiC) is reported in this article. In spite of the nearly ideal behavior of the contact at room temperature (n=1.05), the electrical behavior monitored in a wide temperature range exhibited a deviation from the ideality at lower temperatures, thus suggesting that. an inhomogeneous barrier has actually formed. A description of the experimental results by the Tung's model, i.e., considering an effective area of the inhomogeneous contact, provided a procedure for a correct determination of the Richardson's constant A**. An effective area lower than the geometric area of the diode is responsible for the commonly observed discrepancy in the experimental values of A** from its theoretical value in silicon carbide. The same method was applied to Ti/4H-SiC contacts. (C) 2003 American Institute of Physics.
引用
收藏
页码:9137 / 9144
页数:8
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