Research Progress on Stage Control Methods for a Lithography Machine

被引：1

作者：

Jiang Longbin ^{[1
]}

Ding Runze ^{[1
]}

Ding Chenyang ^{[1
]}

Yang Xiaofeng ^{[2
]}

Xu Yunlang ^{[2
]}

机构：

[1] Fudan Univ, Acad Engn & Technol, Shanghai Engn Res Ctr Ultraprecis Mot Control & M, Shanghai 200433, Peoples R China

[2] Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China

来源：

LASER & OPTOELECTRONICS PROGRESS | 2022年 / 59卷 / 09期

关键词：

lithography machine; motion stage; feedforward control; feedback control; ITERATIVE LEARNING CONTROL; ROBUST-CONTROL; FEEDFORWARD CONTROL; MOTION; SYSTEMS; EQUIPMENT; DESIGN; JERK;

D O I：

10.3788/LOP202259.0922003

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A lithography machine is a key equipment to support the continuous reduction of the size of the integrated circuit. High- performance lithography machine requires high-acceleration and high-precision motion stages. To meet the requirements of the lithography machine, high-performance stage control methods are essential. This paper sorts out and introduces the mainstream control methods of motion stages in the lithography machine. First, the working principle and basic control structure of motion stages are introduced. Then, the control methods of the motion stage are introduced in detail from the aspects of feedforward control, feedback control and over-actuation/ over-sensing, to provide a reference for the further development of control methods of lithography machine motion stages.

引用

页数：13

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