Tribological properties of hydrogenated amorphous carbon thin films by close field unbalanced magnetron sputtering method

被引：0
|
作者：
Park, YS [1 ]
Hong, B
Kim, HJ
机构：
[1] Sungkyunkwan Univ, Sch Informat & Commun Engn, Suwon 440746, South Korea
[2] Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South Korea
来源：
JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 2004年 / 45卷
关键词：
hydrogenated amorphous carbon; close-field unbalanced magnetron (CFUBM) sputtering system; hardness; friction coefficient;
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Thin films of hydrogenated amorphous carbon (a-C : H) generally combine high wear resistance with low friction coefficient. In this study, hydrogenated amorphous carbon (a-C : H) films are deposited on silicon with a Close Field Unbalanced Magnetron (CFUBM) sputtering system of high deposition rate. The experimental data are obtained on the deposition rate and tribological properties of a-C : H films by using DC bias voltage. The films are analyzed by Raman spectroscopy, FT-IR. (Fourier Transform IR. ), and AFM (Atomic Force Microscopy). The tribological properties are investigated by hardness and friction coefficient measurements. Relatively higher hardness and lower surface roughness are characteristics of the films prepared by using DC bias voltage.
引用
收藏
页码：S824 / S828
页数：5
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