Amplitude mask patterned on an excimer laser mirror for high intensity writing of long period fibre gratings

被引：25

作者：

Patrick, HJ ^{[1
]}

Askins, CG ^{[1
]}

McElhanon, RW ^{[1
]}

Friebele, EJ ^{[1
]}

机构：

[1] USN, Res Lab, Div Opt Sci, Washington, DC 20375 USA

来源：

ELECTRONICS LETTERS | 1997年 / 33卷 / 13期

关键词：

gratings in fibres; masks;

D O I：

10.1049/el:19970780

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Masks have been produced for long period fibre grating fabrication from commercial dielectric laser mirrors. The masks, which were produced by direct patterning of a photoresist using an argon laser, can withstand in excess of 200mJ/cm(2) per 15ns pulse of 248nm laser light. The use of these masks decreased exposure times by 90% and nearly doubled the attenuation (dB) of a long period grating produced by a given UV fluence compared to chrome-on-silica masks.

引用

页码：1167 / 1168

页数：2

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