Eddy current testing for detecting small defects in thin films

被引:0
|
作者
Obeid, Simon [1 ]
Tranjan, Farid M.
Dogaru, Teodor
机构
[1] Univ N Carolina, Dept Elect & Comp Engn, Charlotte, NC 28223 USA
[2] Albany Instruments, Charlotte, NC 28262 USA
关键词
eddy current; electromagnetic testing; silicon wafers; metallization; magnetic sensors;
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Presented here is a technique of using Eddy Current based Giant Magneto-Resistance sensor (GMR) to detect surface and sub-layered minute defects in thin films. For surface crack detection, a measurement was performed on a copper metallization of 5-10 microns thick. It was done by scanning the GMR sensor on the surface of the wafer that had two scratches of 0.2 mm, and 2.5 mm in length respectively. In another experiment, metal coatings were deposited over the layers containing five defects with known lengths such that the defects were invisible from the surface. The limit of detection (resolution), in terms of defect size, of the GMR high-resolution Eddy Current probe was studied using this sample. Applications of Eddy Current testing include detecting defects in thin film metallic layers, and quality control of metallization layers on silicon wafers for integrated circuits manufacturing.
引用
收藏
页码:340 / 345
页数:6
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