Pattern formation and localized structures in monoatomic layer deposition

被引：8
|
作者：
Clerc, M. G.
Tirapegui, E.
Trejo, M.
机构：
[1] Univ Chile, Fac Ciencias Fis & Matemat, Dept Fis, Santiago, Chile
[2] Ecole Normale Super, Lab Phys Stat, F-75231 Paris 05, France
来源：
EUROPEAN PHYSICAL JOURNAL-SPECIAL TOPICS | 2007年 / 146卷 / 1期
关键词：
D O I：
10.1140/epjst/e2007-00196-5
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
We study the nonlinear robust behaviors of a model for the deposition of a monolayer of molecules on a surface which takes into account the interactions of the adsorbed molecules. The transport properties of the model lead to non Fickian diffusion. It is shown that we have generically Turing structures coexisting with uniform concentrations and consequently localized structures through the pinning mechanism. The characteristic lengths are in the nanometer region in agreement with recent experiments.
引用
收藏
页码：407 / 425
页数：19
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