An efficient decomposition of NO into N2 and O2 in a fast discharge flow of NO/He mixtures

被引：7
|
作者：
Tsuji, M
Tanaka, A
Hamagami, T
Nakano, K
Nishimura, Y
机构：
[1] Kyushu Univ, Inst Adv Mat Study, Kasuga, Fukuoka 8168580, Japan
[2] Kyushu Univ, Grad Sch Engn Sci, Dept Appl Sci Elect & Mat, Kasuga, Fukuoka 8168580, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2000年 / 39卷 / 9AB期
关键词：
NO removal; discharge flow; microwave discharge; mass spectra; emission spectra;
D O I：
10.1143/JJAP.39.L933
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
About 97% of NO was selectively decomposed into N-2 and O-2 in a fast discharge flow of a NO/He mixture at a microwave power of 150-200 W, and NO and He dow rates of 25 and 2000 sccm, respectively. The decomposition mechanism in the discharge flow is discussed on the basis of mass spectroscopic and optical emission spectroscopic data.
引用
收藏
页码：L933 / L935
页数：3
相关论文
共 50 条
  • [1] Superior decomposition of N2O into N2 and O2 in a fast discharge flow of N2O/He or N2O/Ar mixtures
    Tsuji, M
    Tanoue, T
    Tanaka, A
    Nakano, K
    Hamagami, T
    Nishimura, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2000, 39 (12B): : L1330 - L1333
  • [2] Influence of N2/O2 Mixtures on Decomposition of Naphthalene in Surface Dielectric Barrier Discharge Based Reactor
    Abdelaziz, Ayman A.
    Seto, Takafumi
    Abdel-Salam, M.
    Otani, Yoshio
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2014, 34 (06) : 1371 - 1385
  • [3] Influence of N2/O2 Mixtures on Decomposition of Naphthalene in Surface Dielectric Barrier Discharge Based Reactor
    Ayman A. Abdelaziz
    Takafumi Seto
    M. Abdel-Salam
    Yoshio Otani
    Plasma Chemistry and Plasma Processing, 2014, 34 : 1371 - 1385
  • [4] Characteristics of the N2/O2 mixtures
    Hosokawa, Tatsuzo
    Kaneda, Teruo
    Sekiya, Yoshihisa
    Funato, Yasuyuki
    Yamamoto, Teruo
    IEEE Transactions on Dielectrics and Electrical Insulation, 2012, 19 (06) : 2184 - 2188
  • [5] Negative corona discharge in flowing N2O and its mixtures with N2 and O2
    Galuska, D
    Manole, D
    Vladoiu, R
    Matejcik, S
    Skalny, JD
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2005, 7 (05): : 2371 - 2378
  • [6] Experimental study on the effect of O2 on the discharge decomposition products of C5-PFK/N2 mixtures
    Yalong Li
    Xiaoxing Zhang
    Yi Wang
    Yi Li
    Yue Zhang
    Zhuo Wei
    Song Xiao
    Journal of Materials Science: Materials in Electronics, 2019, 30 : 19353 - 19361
  • [7] Experimental study on the effect of O2 on the discharge decomposition products of C5-PFK/N2 mixtures
    Li, Yalong
    Zhang, Xiaoxing
    Wang, Yi
    Li, Yi
    Zhang, Yue
    Wei, Zhuo
    Xiao, Song
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2019, 30 (21) : 19353 - 19361
  • [8] Plasma model of discharge along a dielectric surface in N2/O2 mixtures
    Sima, Wenxia
    Liu, Chunxiang
    Yang, Ming
    Shao, Qianqiu
    Xu, Hang
    Liu, Sanwei
    PHYSICS OF PLASMAS, 2016, 23 (06)
  • [9] The influence of bremsstrahlung on electric discharge streamers in N2, O2 gas mixtures
    Kohn, C.
    Chanrion, O.
    Neubert, T.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2017, 26 (01):
  • [10] The effect of N2 flow rate in He/O2/N2 on the characteristics of large area pin-to-plate dielectric barrier discharge
    Lee, Yong-Hyuk
    Kyung, Se-Jin
    Jeong, Chang-Hyun
    Yeom, Geun-Young
    Japanese Journal of Applied Physics, Part 2: Letters, 2005, 44 (1-7):
12345