Electroluminescent devices with Ga2O3:Mn thin-film emitting layer prepared by sol-gel process

被引:45
|
作者
Minami, T [1 ]
Shirai, T [1 ]
Nakatani, T [1 ]
Miyata, T [1 ]
机构
[1] Kanazawa Inst Technol, Electron Device Syst Lab, Nonoichi, Ishikawa 9218501, Japan
来源
关键词
oxide phosphor; thin-film electroluminescent device; electroluminescence; phosphor; Ga2O3; sol-gel; chemical deposition; display;
D O I
10.1143/JJAP.39.L524
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-luminance electroluminescent devices have been newly developed using a Ga2O3:Mn thin film prepared by a sol-gel process. The sol-gel process, which eliminates the need for vacuum processes, enabled the inexpensive preparation of Ga2O3:Mn thin films on large-area thick ceramic sheet insulators. Gallium acethylacetonate, a relatively inexpensive and easy to handle material: was used as the Ga source material. Thin-film electroluminescent (TFEL) devices with a Ga2O3:Mn thin-film emitting layer prepared by the sol-gel process at a deposition temperature of degrees and a postannealing temperature of 1000 degrees C exhibited luminances of 1271 and 401 cd/m(2) when driven at 1 kHz and 60 Hz, respectively.
引用
收藏
页码:L524 / L526
页数:3
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