Oxidation of aromatic substrates in water/goethite slurry by means of hydrogen peroxide

被引：92
|
作者：
Andreozzi, R [1 ]
D'Apuzzo, A [1 ]
Marotta, R [1 ]
机构：
[1] Univ Naples Federico II, Fac Ingn, Dipartimento Ingn Chim, I-80125 Naples, Italy
来源：
WATER RESEARCH | 2002年 / 36卷 / 19期
关键词：
goethite; hydrogen peroxide; fenton-like reactions; chemical oxidation; kinetics; phenolic compounds;
D O I：
10.1016/S0043-1354(02)00204-X
中图分类号：
X [环境科学、安全科学];
学科分类号：
08 ; 0830 ;
摘要：
The oxidation of aromatic derivatives in aqueous goethite slurry at varying catalyst load and hydrogen peroxide concentration is investigated. For,adopted experimental conditions only the compounds containing two adjacent -OH groups or one -OH and one -NH2 groups are oxidized. A model previously developed for the oxidation of 3,4dihydroxybenzoic acid has been satisfactorily used to describe the oxidation of 1,2-benzenediol (catechol), 2-aminophenol and 2,3-dihydroxybenzoic acid. (C) 2002 Elsevier Science Ltd. All rights reserved.
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页码：4691 / 4698
页数：8
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