Reactions in TiO2/Ti3Al and TiO2/TiAl bilayers:: application of target-factor analysis in Auger electron spectroscopy

被引:0
|
作者
van Lier, J
Baretzky, B
Zalar, A
Mittemeijer, EJ
机构
[1] Max Planck Inst Met Res, D-70174 Stuttgart, Germany
[2] Inst Surface Engn & Optoelect, Ljubljana 1000, Slovenia
关键词
interfacial reactions; thin films; diffusion; target-factor analysis;
D O I
10.1002/1096-9918(200008)30:1<124::AID-SIA848>3.0.CO;2-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Bilayers of TiO2/Ti3Al and TiO2/TiAl were heated up to 973 K, The resulting concentration-depth profiles were determined using Auger electron spectroscopy in combination with ion sputtering. By applying target-factor analysis it was possible to distinguish between different states of chemical bonding of the elements analysed. In both TiO2/Ti3Al and TiO2/TiAl heating causes decomposition of titanium dioxide at the bilayer interface, as revealed by the associated oxygen diffusion into the metallic layer. In a certain depth range near to the original bilayer, interface oxygen is bonded to both Ti and Al. In the original Ti3Al layer oxygen dissolves homogeneously, whereas Al2O3 was formed in the original TiAl layer, particularly in the central region. Copyright (C) 2000 John Wiley & Sons, Ltd.
引用
收藏
页码:124 / 129
页数:6
相关论文
共 50 条
  • [1] Interdiffusion at TiO2/Ti, TiO2/Ti3Al and TiO2/TiAl interfaces studied in bilayer structures
    Zalar, A
    van Lier, J
    Mittemeijer, EJ
    Kovac, J
    SURFACE AND INTERFACE ANALYSIS, 2002, 34 (01) : 514 - 518
  • [2] Interdiffusion in the TiO2 oxidation product of Ti3Al
    Reddy R.G.
    Wen X.
    Okafor I.C.I.
    Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science, 2001, 32 (03): : 491 - 495
  • [3] Analysis of interface reactions of TiAl/Al2O3 and TiAl/TiO2 by the use of chemical potential diagram
    Inaba, H
    Murata, Y
    JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1997, 105 (09) : 740 - 745
  • [4] Resistive switching characteristics in memristors with Al2O3/TiO2 and TiO2/Al2O3 bilayers
    Alekseeva, Liudmila
    Nabatame, Toshihide
    Chikyow, Toyohiro
    Petrov, Anatolii
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (08)
  • [5] Investigations of TiO2, Ti/TiO2 and Ti/TiO2/Ti/TiO2 coatings produced by ALD and PVD methods on Mg-(Li)-Al-RE alloy substrates
    Staszuk, Marcin
    Reimann, Lukasz
    SciSlak, Aleksandra
    Jaworska, Justyna
    Pawlyta, Miroslawa
    Mikuszewski, Tomasz
    Kuc, Dariusz
    TaNski, Tomasz
    Kriz, Antonin
    BULLETIN OF THE POLISH ACADEMY OF SCIENCES-TECHNICAL SCIENCES, 2021, 69 (05)
  • [6] ADSORPTION OF CO2 ON TIO2 AND PT/TIO2 STUDIED BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND AUGER-ELECTRON SPECTROSCOPY
    TANAKA, K
    MIYAHARA, K
    TOYOSHIMA, I
    JOURNAL OF PHYSICAL CHEMISTRY, 1984, 88 (16): : 3504 - 3508
  • [7] Wettability and interfacial reactions in Al/TiO2
    Sobczak, N
    Stobierski, L
    Radziwill, W
    Ksiazek, M
    Warmuzek, M
    SURFACE AND INTERFACE ANALYSIS, 2004, 36 (08) : 1067 - 1070
  • [8] Preparation of TiO2/ITO and TiO2/Ti photoelectrodes by magnetron sputtering for photocatalytic application
    Department of Civil and Structural Engineering, The Hong Kong Polytechnic University, Hong Kong, Hong Kong
    不详
    Appl Catal A Gen, 2006, 1 (54-63):
  • [9] Investigation of Ti/Al2O3 + TiO2 and Ti + TiO2/Al2O3 + TiO2 hybrid coatings as protection of ultra-light Mg–(Li)–Al–RE alloys against corrosion
    Marcin Staszuk
    Daniel Pakuła
    Łukasz Reimann
    Małgorzata Musztyfaga-Staszuk
    Robert Socha
    Tomasz Tański
    Scientific Reports, 12
  • [10] Interfacial reactions in Al2O3/Ti, Al2O3/Ti3Al and Al2O3/TiAl bilayers
    Zalar, A
    Baretzky, BMM
    Hofmann, S
    Rühle, M
    Panjan, P
    THIN SOLID FILMS, 1999, 352 (1-2) : 151 - 155