Investigation of temperature-dependent asymmetric degradation behavior induced by hot carrier effect in oxygen ambiance in In-Ga-Zn-O thin film transistors

被引:9
|
作者
Chen, Bo-Wei [1 ]
Chang, Ting-Chang [2 ,3 ]
Hung, Yu-Ju [1 ]
Hsieh, Tien-Yu [2 ]
Tsai, Ming-Yen [1 ]
Liao, Po-Yung [2 ]
Tsai, Wu-Wei [4 ]
Chiang, Wen-Jen [4 ]
Yan, Jing-Yi [4 ]
机构
[1] Natl Sun Yat Sen Univ, Dept Photon, Kaohsiung 80424, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[3] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 70101, Taiwan
[4] Ind Technol Res Inst, Hsinchu 31040, Taiwan
关键词
Indium gallium zinc oxide (IGZO); Thin film transistors (TFTs); Light illumination; Hot carrier stress; MEMORY DEVICE; ORIGIN; TFTS; MECHANISM; LAYER;
D O I
10.1016/j.tsf.2014.09.051
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of oxygen ambiance on electrical characteristic degradation phenomena in a-InGaZnO thin film transistor with different biases and temperatures are investigated. It can be found that oxygen is substantially adsorbed on the backchannel and results in device instabilities during positive gate bias stress. However, visible light irradiation is found to desorb the adsorbed oxygen ions and this verifies that oxygen dominates the degradation behavior. Moreover, comparing with that in vacuum, hot-carrier stress in oxygen ambiance leads to an extra potential barrier height near the drain side due to oxygen adsorption and causes asymmetric degradation. Furthermore, the asymmetric degradation behavior after hot-carrier stress in oxygen ambiance is suppressed at high temperature due to temperature-induced oxygen desorption or heat-induced holes injecting into the gate insulator. (C) 2014 Published by Elsevier B.V.
引用
收藏
页码:33 / 38
页数:6
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