Field-emission characteristics of hydrogenated amorphous carbon films prepared by surface wave plasma

被引：36
|
作者：
Nagatsu, M
Sano, T
Takada, N
Guang, WX
Hirao, T
Sugai, H
机构：
[1] Nagoya Univ, Grad Sch Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[2] Osaka Univ, Grad Sch Engn, Suita, Osaka 5650871, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2000年 / 39卷 / 9AB期
关键词：
field-emission display; surface wave plasma; UHF plasma; hydrogenated amorphous carbon film; plasma CVD;
D O I：
10.1143/JJAP.39.L929
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Hydrogenated amorphous carbon films are prepared by a 40-cm-diameter planar surface wave plasma to apply them to field-emission display. The 2.45 GHz surface wave plasmas at 700W give a film deposition rate of similar to 15 nm/min in He gas mixed with a small amount of methane gas at a relatively low pressure of 100 to 200 mTorr. Preliminary experimental results show that the hydrogenated amorphous carbon films deposited on silicon substrates have good field-emission characteristics: a threshold electric field defined at 1 mu A/cm(2) was roughly 4 V/mu m and an emission current of 0.1 mA/cm(2) was achieved at an electric field of 7.5 V/mu m.
引用
收藏
页码：L929 / L932
页数：4
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