High-accuracy CMM metrology for micro systems.

被引：0

作者：

Bos, EJC ^{[1
]}

Delbressine, FLM ^{[1
]}

Haitjema, H ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Precis Engn Sect, NL-5600 MB Eindhoven, Netherlands

来源：

MEASURE AND QUALITY CONTROL IN PRODUCTION | 2004年 / 1860卷

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The increasing use of micro systems in industry combined with an ever-increasing demand for higher measurement accuracy has led to ongoing developments in the field of dimensional metrology. Recently, several measuring machines suitable for measuring micro mechanical products have been introduced to the market. This article aims to give an overview of the state-of-the-art methods for these measurement tasks.

引用

页码：511 / 522

页数：12

共 50 条

[1] Usage of polarization for high-accuracy micro-metrology sensors
Totzeck, M
Jacobsen, H
Tiziani, HJ
[J]. ADVANCED PHOTONIC SENSORS AND APPLICATIONS, 1999, 3897 : 424 - 435
[2] Design for a compact high-accuracy CMM
Peggs, G.N.
Lewis, A.J.
Oldfield, S.
[J]. CIRP Annals - Manufacturing Technology, 1999, 48 (01): : 417 - 420
[3] Design for a compact high-accuracy CMM
Peggs, GN
Lewis, AJ
Oldfield, S
[J]. CIRP ANNALS 1999 - MANUFACTURING TECHNOLOGY, 1999, : 417 - 420
[4] High-accuracy laser metrology enhances the VLTI
Lévéque, S
Salvadé, Y
Dändliker, R
Scherler, O
[J]. LASER FOCUS WORLD, 2002, 38 (04): : 101 - +
[5] HIGH-ACCURACY ISOTOPE ABUNDANCE MEASUREMENTS FOR METROLOGY
DEBIEVRE, P
VALKIERS, S
SCHAEFER, F
PEISER, HS
SEYFRIED, P
[J]. PTB-MITTEILUNGEN, 1994, 104 (04): : 225 - 236
[6] High-accuracy laser metrology enhances the VLTI
Leveque, Samuel
Salvade, Yves
Dandliker, Rene
Scherler, Olivier
[J]. Laser Focus World, 2002, 38 (04):
[7] HIGH-ACCURACY FINITE-ELEMENT METHODS FOR POSITIVE SYMMETRIC SYSTEMS.
Layton, William
[J]. Computers & mathematics with applications, 1986, 12 A (4-5): : 565 - 579
[8] Waveforms and Signal Processing for High-Accuracy Microwave Metrology
Zilevu, Kojo S.
Hodkin, Jason E.
Sharp, Matthew D.
Comberiate, Thomas M.
Nanzer, Jeffrey A.
[J]. 2015 IEEE INTERNATIONAL SYMPOSIUM ON ANTENNAS AND PROPAGATION & USNC/URSI NATIONAL RADIO SCIENCE MEETING, 2015, : 977 - 978
[9] High-accuracy detector calibration for EUV metrology at PTB
Scholze, F
Brandt, G
Müller, P
Meyer, B
Scholz, F
Tümmler, J
Vogel, K
Ulm, G
[J]. EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 680 - 689
[10] High-accuracy, high-speed, and smart metrology in the EUV era
Wang Zhigang
Kei, Sakai
Yasushi, Ebizuka
[J]. METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIV, 2020, 11325

← 1 2 3 4 5 →