Spectroscopic studies of laser ablated ZnO plasma and correlation with pulsed laser deposited ZnO thin film properties

被引：14
|
作者：
Shukla, Gaurav [1 ]
Khare, Alika [1 ]
机构：
[1] Indian Inst Technol Guwahati, Dept Phys, Gauhati 781039, India
来源：
LASER AND PARTICLE BEAMS | 2010年 / 28卷 / 01期
关键词：
Laser ablation; Optical emission spectroscopy; ZnO; Thin film; Pulsed laser deposition; SILVER IONS; EMISSION; PLUME; GAS; DISTRIBUTIONS; GENERATION; GROWTH; TARGET;
D O I：
10.1017/S0263034610000029
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
In this paper, measurement of various plasma parameters during pulsed laser deposition of ZnO thin films on Si (100) substrates is reported. The variations of electron number density and electron temperature with ambient pressure and target substrate distance is obtained via spectroscopic measurements. The structural and optical properties of ZnO thin films were analyzed using X-ray diffraction, scanning electron microscope, and photoluminescence and then correlated with spectroscopic results to find optimum conditions for the deposition of high quality ZnO thin films.
引用
收藏
页码：149 / 155
页数：7
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