Room temperature operation of patterned InGaAs quantum dot lasers fabricated by electron beam lithography and selective area epitaxy

被引:0
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作者
Elarde, VC [1 ]
Rangarajan, R [1 ]
Borchardt, JJ [1 ]
Coleman, JJ [1 ]
机构
[1] Univ Illinois, Dept Elect & Comp Engn, Micro & Nanotechnol Lab, Urbana, IL 61801 USA
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O43 [光学];
学科分类号
070207 ; 0803 ;
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页码:65 / 66
页数:2
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