Electronic states and chemical reactivity of Si(100)c(4 x 2) surface at low temperature studied by high resolution Si 2p core level photoelectron spectroscopy

被引:4
|
作者
Machida, S [1 ]
Nagao, M [1 ]
Yamamoto, S [1 ]
Kakefuda, Y [1 ]
Mukai, K [1 ]
Yamashita, Y [1 ]
Yoshinobu, J [1 ]
机构
[1] Univ Tokyo, Inst Solid State Phys, Kashiwa, Chiba 2778581, Japan
关键词
silicon; photoelectron spectroscopy; halides;
D O I
10.1016/S0039-6028(03)00177-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated the electronic states of clean and BF3 adsorbed Si(l 0 0) surfaces at low temperature by means of high resolution Si 2p photoelectron spectroscopy. The peak intensities of upper atom and lower atom of the asymmetric dimer in Si 2p spectra do not change even at 30 K compared with those at higher temperature up to 300 K, indicating that the dimer is asymmetric in the ground state. In order to investigate chemical reactivity of asymmetric dimer on Si(I 0 0), a typical Lewis acid molecule BF3 is adsorbed on Si(I 0 0). We have found that BF3 molecules are dissociated into BF2 and F on Si(I 0 0) and dissociated species (BF2 and F) are adsorbed predominantly on the up dimer atoms of the asymmetric dimers. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:716 / 720
页数:5
相关论文
共 50 条
  • [1] Sb/Si(110)2x3 surface studied by high-resolution Si 2p core-level photoemission spectroscopy
    Cricenti, A
    Ottaviani, C
    Comicioli, C
    Perfetti, P
    Le Lay, G
    PHYSICAL REVIEW B, 1998, 58 (11): : 7086 - 7090
  • [2] Direct evidence for asymmetric dimer on Si(100) at low temperature by means of high-resolution Si 2p photoelectron spectroscopy
    Yamashita, Y
    Machida, S
    Nagao, M
    Yamamoto, S
    Kakefuda, Y
    Mukai, K
    Yoshinobu, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2002, 41 (3A): : L272 - L274
  • [3] Surface chemistry of HfI4 on Si(100)-(2 x 1) studied by core level photoelectron spectroscopy
    Sandell, A.
    Karlsson, P. G.
    Richter, J. H.
    Blomquist, J.
    Uvdal, P.
    SURFACE SCIENCE, 2007, 601 (04) : 917 - 923
  • [4] Pb/Si(100)2 x 1 surface studied by high resolution core-level photoemission spectroscopy
    Cricenti, A
    Ottaviani, C
    Perfetti, P
    Le Lay, G
    SURFACE SCIENCE, 2003, 544 (2-3) : 227 - 233
  • [5] Oxidized silicon surfaces studied by high resolution Si 2p core-level photoelectron spectroscopy using synchrotron radiation
    Jolly, F
    Rochet, F
    Dufour, G
    Grupp, C
    Taleb-Ibrahimi, A
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2001, 280 (1-3) : 150 - 155
  • [6] Nature of interface bonding of ethylene and benzene with Si(100)c(4 x 2): angle-dependent Si 2p high resolution photoelectron spectroscopy studies
    Nagao, M
    Yamashita, Y
    Machida, S
    Hamaguchi, K
    Yasui, F
    Mukai, K
    Yoshinobu, J
    SURFACE SCIENCE, 2002, 513 (03) : 413 - 421
  • [7] High resolution syncrotron radiation Si 2p core-level spectroscopy of Si(110)16x2
    Cricenti, A
    LeLay, G
    Aristov, VY
    Nesterenko, B
    Safta, N
    Lacharme, JP
    Sebenne, CA
    TalebIbrahimi, A
    Indlekofer, G
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1995, 76 : 613 - 617
  • [8] Ge/Si(001)c(4X2) interface formation studied by high-resolution Ge 3d and Si 2p core-level spectroscopy
    Larciprete, R
    De Padova, P
    Quaresima, C
    Ottaviani, C
    Perfetti, P
    Peloi, M
    PHYSICAL REVIEW B, 2000, 61 (23) : 16006 - 16014
  • [9] Residual gas effects on high-resolution Si 2p spectra of Si(100)c(4 x 2)
    Yamashita, Y
    Machida, S
    Mukai, K
    Yoshinobu, J
    SURFACE SCIENCE, 2004, 566 : 467 - 470
  • [10] High resolution Si 2p photoelectron spectroscopy of unsaturated hydrocarbon molecules adsorbed on Si(100)c(4X2): the interface bonding and charge transfer between the molecule and the Si substrate
    Yamashita, Y
    Nagao, M
    Machida, S
    Hamaguchi, K
    Yasui, F
    Mukai, K
    Yoshinobu, J
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2001, 114 : 389 - 393