Diffusion-limited electrodeposition of ultrathin Au films

被引:30
|
作者
Sibert, E [1 ]
Ozanam, F [1 ]
Maroun, F [1 ]
Behm, RJ [1 ]
Magnussen, OM [1 ]
机构
[1] Univ Ulm, Abt Oberflachenchem & Katalyse, D-89069 Ulm, Germany
关键词
electrochemical methods; scanning tunneling microscopy; platinum; gold; metallic films; growth; solid-liquid interfaces; surface diffusion; single crystal epitaxy; adatoms;
D O I
10.1016/j.susc.2004.07.055
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The electrodeposition of Au on Pt(111) from electrolytes containing ltM concentrations of AuCl4- was studied by in situ scanning tunneling microscopy. Under these conditions the Au flux is limited by diffusion in the electrolyte over a wide potential range, which allows to assess the effect of the electrochemical environment on the growth kinetics. Similar to gas phase metal deposition Au film growth proceeds via nucleation and lateral growth of Au monolayer islands, with the saturation island density strongly depending on the deposition potential and on the anion species in the electrolyte. For deposition in H2SO4 solution the saturation island density continuously increases with increasing potential between -0.2 and 0.5V (SCE), whereas in Cl-containing H2SO4 it first decreases and then increases again. Following nucleation and growth theories this behavior can be attributed to potential-induced changes of the Au surface mobility, caused by changes in the density and structure of coadsorbed sulfate/bisulfate and chloride adlayers. Under conditions of high Au surface mobility multilayer growth proceeds via a typical Stranski-Krastanov growth mode, with layer-bylayer growth of a pseudomorphic An film up to 2 ML and 3D growth of structurally relaxed islands at higher coverage, indicating thermodynamic control under these conditions. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:115 / 125
页数:11
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