Thin films of ferroelectrics made by pulsed laser deposition for optoelectronic applications

被引：0
|
作者：
Chrisey, DB [1 ]
Knauss, LA [1 ]
Horwitz, JS [1 ]
Auyeung, RCY [1 ]
Knies, D [1 ]
Grabowski, KS [1 ]
Donovan, EP [1 ]
McCallion, K [1 ]
Johnstone, W [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
ADVANCED LASER PROCESSING OF MATERIALS - FUNDAMENTALS AND APPLICATIONS | 1996年 / 397卷
关键词：
D O I：
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：193 / 198
页数：6
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