Photoresists

被引：0

作者：

Luro, M ^{[1
]}

机构：

[1] Opteco, Buenos Aires, DF, Argentina

来源：

关键词：

D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：77 / 77

页数：1

共 50 条

[1] Photoresists
Birkett, D
CHEMISTRY & INDUSTRY, 2002, (10) : 18 - 18
[2] EXPOSURE OF PHOTORESISTS - ELECTRON BEAM EXPOSURE OF NEGATIVE PHOTORESISTS
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (09) : 1241 - &
[3] The skinny on photoresists
不详
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[4] Irresistible photoresists
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[5] Sumitomo photoresists
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[6] Photoresists for microlithography
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Kobunshi, 2011, 60 (03) : 118 - 121
[7] ORGANIC PHOTORESISTS DEPOSITED AND DEVELOPED BY DRY METHODS (VACUUM PHOTORESISTS)
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VASILEV, AI
DUBININ, NV
IVASHCHENKO, AV
TITOV, VV
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JOURNAL OF APPLIED CHEMISTRY OF THE USSR, 1983, 56 (03): : 692 - 692
[8] Dry film photoresists
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[9] DRY FILM PHOTORESISTS
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SOLID STATE TECHNOLOGY, 1986, 29 (06) : 153 - 157
[10] CHARACTERIZATION OF THE DEVELOPMENT OF PHOTORESISTS
GROSSMANN, A
POHLMANN, L
FRIEDRICH, S
ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-LEIPZIG, 1988, 269 (06): : 1260 - 1262