4H-SiC photoconductive switching devices for use in high-power applications

被引:87
|
作者
Dogan, S
Teke, A
Huang, D
Morkoç, H
Roberts, CB
Parish, J
Ganguly, B
Smith, M
Myers, RE
Saddow, SE
机构
[1] Virginia Commonwealth Univ, Dept Elect Engn, Richmond, VA 23284 USA
[2] Ltd Liabil Corp, Tech Explore, Oxford, OH 45056 USA
[3] USAF, Res Lab, Wright Patterson AFB, OH 45433 USA
[4] Elect Engn Univ S Florida, Tampa, FL 33543 USA
[5] Ataturk Univ, Fac Arts & Sci, Dept Phys, TR-25240 Erzurum, Turkey
[6] Balikesir Univ, Fac Arts & Sci, Dept Phys, TR-10100 Balikesir, Turkey
关键词
D O I
10.1063/1.1571667
中图分类号
O59 [应用物理学];
学科分类号
摘要
Silicon carbide is a wide-band-gap semiconductor suitable for high-power high-voltage devices and it has excellent properties for use in photoconductive semiconductor switches (PCSSs). PCSS were fabricated as planar structures on high-resistivity 4H-SiC and tested at dc bias voltages up to 1000 V. The typical maximum photocurrent of the device at 1000 V was about 49.4 A. The average on-state resistance and the ratio of on-state to off-state currents were about 20 Omega and 3x10(11), respectively. Photoconductivity pulse widths for all applied voltages were 8-10 ns. These excellent results are due in part to the removal of the surface damage by high-temperature H-2 etching and surface preparation. Atomic force microscopy images revealed that very good surface morphology, atomic layer flatness, and large step width were achieved. (C) 2003 American Institute of Physics.
引用
收藏
页码:3107 / 3109
页数:3
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