Native oxide layers formed on the surface of ultra high-purity iron and copper investigated by angle resolved XPS

被引:102
|
作者
Suzuki, S [1 ]
Ishikawa, Y [1 ]
Isshiki, M [1 ]
Waseda, Y [1 ]
机构
[1] Tohoku Univ, Inst Adv Mat Proc, Aoba Ku, Sendai, Miyagi 98077, Japan
来源
MATERIALS TRANSACTIONS JIM | 1997年 / 38卷 / 11期
关键词
ultra high-purity iron; ultra high-purity copper; angle resolved X-ray photoelectron spectroscopy; initial oxidation;
D O I
10.2320/matertrans1989.38.1004
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Angle resolved X-ray photoelectron spectroscopy (AR-XPS) has been used for characterizing native oxide layers formed on the surface of ultra high-purity iron and copper by exposure to air at room temperature. Thickness of an oxide layer formed on the surface of ultra high-purity iron is found to be thicker than that for ultra high-purity copper in the initial stage of oxidation and almost unchanged by air exposure time. On the other hand, thickness of an oxide layer formed on ultra high-purity copper is found to increase with increasing air exposure time. These results are consistent with spectral information for ultra high-purity iron and copper exposed to air; the chemical state of Fe in the surface of ultra high-purity iron is almost independent of exposure time, whereas the chemical state varies in the surface of ultra high-purity copper by exposure for a long term.
引用
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页码:1004 / 1009
页数:6
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