Nonlinear model predictive control:: from chemical industry to microelectronics

被引：4
|
作者：
Nagy, ZK [1 ]
Allgöwer, F [1 ]
机构：
[1] Inst Syst Theory Engn, D-70550 Stuttgart, Germany
来源：
2004 43RD IEEE CONFERENCE ON DECISION AND CONTROL (CDC), VOLS 1-5 | 2004年
关键词：
D O I：
10.1109/CDC.2004.1429419
中图分类号：
TP [自动化技术、计算机技术];
学科分类号：
0812 ;
摘要：
The paper presents a general overview of nonlinear model predictive control (NMPC), with emphasis on problems related to robust end-point property control of batch processes. The potential advantages of using NMPC in the microelectronics industry are demonstrated using an example process of thin film deposition.
引用
收藏
页码：4249 / 4254
页数：6
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