Effect of cold electron emission on diffusion plasma parameters and the sheath structure in a double plasma device

被引:0
|
作者
Mishra, M. K. [1 ]
Phukan, A. [2 ]
Chakraborty, M. [3 ]
机构
[1] Baosi Banikanta Kakati Coll, Dept Phys, Barpeta 781311, Assam, India
[2] Madhabdev Coll, Dept Phys, Lakhimpur 784164, Assam, India
[3] Inst Plasma Res, Ctr Plasma Phys, Sonapur 782402, Assam, India
关键词
TEMPERATURE CONTROL; ION; INJECTION; BEAM;
D O I
10.1134/S1063776114070048
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
It is observed experimentally that by injecting cold electrons in the discharge region of a double plasma device, the plasma parameters and sheath structure can be controlled in the other region, which is devoid of any electrical discharge. The main discharge region is separated from the region under investigation by a grounded mesh grid. Both cold and hot ionizing electrons are emitted from separate sets of filaments in the discharge region. With an increase in the cold electron emission current, the plasma parameters in the discharge region get changed, which in turn alter the plasma parameters in the other region. Two important effects caused by cold electrons in the diffusion region are the increase in the plasma density and decrease in the plasma potential. The increase in the plasma density and decrease in the sheath potential drop therefore cause the contraction of the sheath.
引用
收藏
页码:326 / 330
页数:5
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