Sulphur based surface passivation for high voltage GaAs Schottky diodes

被引:7
|
作者
Wright, NG [1 ]
Johnson, CM [1 ]
O'Neill, AG [1 ]
机构
[1] Univ Newcastle Upon Tyne, Dept Elect & Elect Engn, Newcastle Upon Tyne NE1 7RU, Tyne & Wear, England
基金
英国工程与自然科学研究理事会;
关键词
73.30. + y; 82.65; -; i; 85.30.Hi; 85.30.Mn;
D O I
10.1016/S0038-1101(97)00275-X
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface passivation of high voltage GaAs Schottky diodes by sulphur containing solutions is investigated. A range of diodes with maximum voltage ratings in excess of 100 V were fabricated using Na2S or (NH4)(2)S-x chemical treatments prior to Schottky deposition. It is demonstrated that, whilst Na2S might provide an efficient passivation at low reverse biases, diodes passivated with this chemical showed little reduction in reverse leakage current under high reverse voltages. By contrast, (NH4)(2)S-x is shown to be an effective surface passivation under reverse bias in excess of 200 V - reducing leakage currents by at least two orders of magnitude in simple diodes (from 10(-2) to 10(-4) A cm(-2)) and extending the breakdown voltage of mesa terminated diodes from 150 to 250 V. (C) 1988 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:437 / 440
页数:4
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