Direct & pulse current electrodeposition of iron group thin film alloys containing vanadium

被引：0
|
作者：
Schwartz, M [1 ]
Arcos, C [1 ]
Nobe, K [1 ]
机构：
[1] Univ Calif Los Angeles, Sch Engn & Appl Sci, Dept Chem Engn, Los Angeles, CA 90095 USA
来源：
PLATING AND SURFACE FINISHING | 2003年 / 90卷 / 06期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
Direct current (DC) and pulse current (PC) electrodeposition of binary and ternary alloys of the iron group (IG) metals and vanadium are discussed. 90 Co/10 Fe alloy compositions with substitutional additions of desirable small amounts of V (similar to2%) were obtained; Co-Ni-V and Ni-Fe-V alloys were also deposited. The effects of complexer, pH and current density on deposit composition and cathode current efficiency (CCE) are discussed and compared to deposition of binary alloys of the iron group only. Impedance measurements indicate greater corrosion resistance for ternary Co-Fe-V alloys than for binary Co-Fe alloys. Crude magnetic measurements show approximately two times greater "relative magnetic moments" for Co-Fe-V deposits than for deposits from typical Ni-Fe (Permalloy) solutions.
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收藏
页码：46 / 51
页数：6
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