Yield stress measurement of silicon nitride suspensions

被引：5

作者：

Zhu, LX ^{[1
]}

Papadopoulos, K ^{[1
]}

De Kee, D ^{[1
]}

机构：

[1] Tulane Univ, Dept Chem Engn, Tulane Inst Macromol Engn & Sci, New Orleans, LA 70118 USA

来源：

CANADIAN JOURNAL OF CHEMICAL ENGINEERING | 2002年 / 80卷 / 06期

关键词：

yield stress; suspensions; silicon nitride;

D O I：

10.1002/cjce.5450800619

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Yield stress values of silicon nitride suspensions were measured via a novel slotted plater device and a constant stress rheometer and the results were compared. Test platform velocity, associated with thee slotted plate method, was found to have substantial effect on dynamic yield stress but not on static yield stress. The effects of suspension concentration and temperature on yield stress values were investigated. Yield stress measurements on mixtures of silicon nitride and alumina particles, as well as creep tests were performed.

引用

页码：1175 / 1180

页数：6

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