The study of the thin magnetic film Fe and multilayer Fe/Hf with the slow positron beam

被引：0
|
作者：
Koizumi, T
Iwamoto, A
Ohtaki, H
Murashige, Y
Tashiro, M
Kanazawa, I
Komori, F
Ito, Y
机构：
[1] Tokyo Gakugei Univ, Dept Phys, Tokyo 184, Japan
[2] Univ Tokyo, Inst Solid State Phys, Minato Ku, Tokyo 106, Japan
[3] Univ Tokyo, Res Ctr Nucl Sci & Technol, Tokai, Ibaraki 39111, Japan
来源：
POSITRON ANNIHILATION: ICPA-11 - PROCEEDINGS OF THE 11TH INTERNATIONAL CONFERENCE ON POSITRON ANNIHILATION, KANSAS CITY, MISSOURI, USA, MAY 1997 | 1997年 / 255-2卷
关键词：
thin magnetic film Fe; multilayer Fe/Hf; sow positron beam;
D O I：
10.4028/www.scientific.net/MSF.255-257.626
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The position annibilation parameters versus the incident positron energy are measured ill the thin Fe film and the bilayer Fe/Hf on thr silica substrate by means of the variable energetic slow-position beam technique. We have analyzed the change in vacancy-type defects in the Fe microcrystals in these bilayers through annealing.
引用
收藏
页码：626 / 628
页数：3
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