Avalanche multiplication in GaInP/GaAs single heterojunction bipolar transistors

被引:22
|
作者
Flitcroft, RM [1 ]
David, JPR [1 ]
Houston, PA [1 ]
Button, CC [1 ]
机构
[1] Univ Sheffield, Dept Elect & Elect Engn, Sheffield S1 3JD, S Yorkshire, England
基金
英国工程与自然科学研究理事会;
关键词
avalanche breakdown; gallium compounds; heterojunction bipolar transistors; impact ionization; semiconductor device breakdown; semiconductor materials; semiconductor materials measurements; transistors;
D O I
10.1109/16.678515
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electron multiplication factors in GaInP/GaAs single heterojunction bipolar transistors (HBT's) have been measured as a function of base-collector bias for a range of GaAs collector doping densities. In the lowest doped (5 x 10(14) cm(-3)) thick collector the multiplication is determined by the local electric field. As the collector doping increases, the measured multiplication is found to be significantly reduced at low values of multiplication from that predicted by the electric field profile. However, good agreement is always found at high multiplication, close to breakdown. This reduction in multiplication at low electric fields is attributed to the dead space, the minimum distance over which carriers must travel before gaining the ionization threshold energy. A simple correction for the dead space is proposed, allowing the multiplication to be accurately predicted even in heavily doped structures.
引用
收藏
页码:1207 / 1212
页数:6
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