Vacancy Defects in Delafossite CuAlO2: First-Principles Calculations

被引:1
|
作者
Zhong, Mi [1 ,2 ]
Liu, Qi-Jun [1 ,2 ]
Jiao, Zhen [1 ,2 ]
Liu, Fu-Sheng [1 ,2 ]
Liu, Zheng-Tang [3 ]
机构
[1] Southwest Jiaotong Univ, Sch Phys Sci & Technol, Minist Educ China, Key Lab Adv Technol Mat, Chengdu 610031, Peoples R China
[2] Southwest Jiaotong Univ, Bond & Band Engn Grp, Sichuan Prov Key Lab Univ High Pressure Sci & Tec, Chengdu 610031, Peoples R China
[3] Northwestern Polytech Univ, State Key Lab Solidificat Proc, Xian 710072, Peoples R China
基金
中国国家自然科学基金;
关键词
density functional theory; vacancy defect; CuAlO2; SEMICONDUCTOR CUALO2; THIN-FILMS; OPTOELECTRONIC PROPERTIES; ELECTRICAL-CONDUCTIVITY; CA; AL;
D O I
10.3103/S0027134917020114
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Electronic properties and formation energies of vacancy defects in delafossite CuAlO2 have been investigated by using the first-principles density functional theory. The band structures and density of states of various vacancy defects have been obtained and analyzed. The results show that the V (Cu) systems with different charge states influence the type of conductivity. The introduced vacancy defects enhance the hybridization between O-2p and Cu-3d states, which is good for p-type conductivity. The calculated formation energies indicate that the Cu vacancy is relatively easy to form and it trends to have positive charge.
引用
收藏
页码:191 / 195
页数:5
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